Plasma Etching
Fundamentals and Applications
Format:Hardback
Publisher:Oxford University Press
Published:28th May '98
Currently unavailable, and unfortunately no date known when it will be back

The focus of this book is the remarkable advances in understanding of low pressure RF (radio frequency) glow discharges. A basic analytical theory and plasma physics are explained. Plasma diagnostics are also covered before the practicalities of etcher use are explored.
ISBN: 9780198562870
Dimensions: 242mm x 163mm x 23mm
Weight: 743g
356 pages