Plasma Etching
Fundamentals and Applications
Format:Hardback
Publisher:Oxford University Press
Published:28th May '98
Should be back in stock very soon

The focus of this book is the remarkable advances in understanding of low pressure RF (radio frequency) glow discharges. A basic analytical theory and plasma physics are explained. Plasma diagnostics are also covered before the practicalities of etcher use are explored.
ISBN: 9780198562870
Dimensions: 242mm x 163mm x 23mm
Weight: 743g
356 pages