Plasma Etching

Fundamentals and Applications

M Sugawara author

Format:Hardback

Publisher:Oxford University Press

Published:28th May '98

Currently unavailable, and unfortunately no date known when it will be back

Plasma Etching cover

The focus of this book is the remarkable advances in understanding of low pressure RF (radio frequency) glow discharges. A basic analytical theory and plasma physics are explained. Plasma diagnostics are also covered before the practicalities of etcher use are explored.

ISBN: 9780198562870

Dimensions: 242mm x 163mm x 23mm

Weight: 743g

356 pages